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전체게시물 총 60건

장비
Nano-Spec (Thin Film Thickness Measurement System)
장비이름
[Measurement & Analysis]Nano-Spec (Thin Film Thickness Measurement System)
? Detector Resolution : 1.7nm 미만
? Thickness Range : 200? ~ 35um
? Detection Range : 400nm ~ 800nm
? Detector Speed : 4sec 미만
  • 제작사 엘립소테크놀러지
  • 모델명 Thin Film Thickness Measurement System
  • 도입연도 2005-12
  • 용도 절연체 두께 및 반사율 측정
Elipsometer
장비이름
[Measurement & Analysis]Elipsometer
? Wavelength : 350 ~ 840 nm or 1.5 ~ 3.5 eV (UV option : 250 ~ 840 nm or 1.5 ~ 5.0 eV)
? Measurement : items Film thickness, n, k
? Accuracy : 1048.85 Å ±0.29 Å for 1049 Å SiO2 on c-Si
? Thickness range “: 1Å ~ 3um (depends on sample)
? Throughput : 5 ~ 10 sec per point (depends on sample)
? Angle of Incidence : 45 ~ 90 with 5 step ( manually variable of incidence)
? Sample size : 5mm x 5mm ~ 200 mm x 200 mm
? Foot print : 400 mm (W) x 300 mm (D) x 300 mm (H)
  • 제작사 나노뷰
  • 모델명 SE MG-1000
  • 도입연도 2005-12
  • 용도 투명박막 두께 및 굴절률 측정
Probe Station
장비이름
[Measurement & Analysis]Probe Station
? Probe station body
- 150mm Manual Probe Statino
- 150 x 150 x 10mm X-Y-Z Manual Stage Drive
- Accuracy : ±1 micron
? Microscope
- Zoom Microscope body with 0.67x ~ 4.5x
- Including Dust Cover C011
- Max 180x
- 20x Eyepiece
- 2x Objective Lenns
? Manipulator
- 100TPI Resolution
- Vacuum Base
- Accuracy : Less than ±2 micron
? Probe Holder
- Noise Level : Less than 10 femto
  • 제작사 Cascade Microtech
  • 모델명 Alessi REL 4100
  • 도입연도 2005-03
  • 용도 다양한 종류의 전자소자 및 광소자의 특성을 평가하기 위하여 마이크로 프로브로 칩을 수동을 프로빙한다. 시스템 DC 및 HF 평가가 가능하며 저전류 저잡음이 특징
Optical Microscope
장비이름
[Measurement & Analysis]Optical Microscope
? Nosepiece
- 6 position motorized revolving objective nosepiece
- Repeatability :?±2um
? Focus Drive
- Coarse : 5mm/rotation
- Fine : 0.1mm/rotation
- Ultrafine : 20um/rotation 이하
- Sensitivity : 0.2um 이하
? Stage
- 8“ x 8” (205x205 mm)
? Objective
- High resolution objectives
- Magnification : 5x, 10x, 20x, 50x, 100x, 150x
? Eyepiece
- Field of view : 25mm 이상
- View angle : 30 (Variable)
? Lamps : 12V 100W Halogen
? Total magnification : 16x ~ 4000x
  • 제작사 Leica
  • 모델명 INM 100
  • 도입연도 2005-03
  • 용도 샘플 표면형상의 관찰
Hall effect measurement system
장비이름
[Measurement & Analysis]Hall effect measurement system
? Standard Sample Resistance Ranges : 10 mohm ~ 10 Mohm
? Field : 2 Tesla
? Temperature : 15K ~ 300K (Closed Cycle Refrigerator)
? Measurement : Up to 4 samples
? Van der Pauw Geometry
? Maximum Sample Diameter : 60mm
  • 제작사 Lake Shore Cryotronics
  • 모델명 7604
  • 도입연도 2005-02
  • 용도 반도체 물질의 Carrier 농도 Type Mobility 등을 측정
Alpha-Step (Step Height Measurement)
장비이름
[Measurement & Analysis]Alpha-Step (Step Height Measurement)
? Scanning stylus (standard): 5-micron radius tip, 60° angled stylus
? Stylus force : 15 mg (nominal setting)
? Profile length (max) : 10 mm in the right direction, 2 mm in the left direction
? Maximum step height : 2 mm (for stepping down conditions only)
? Scan Length : 10 mm
? Scan Speed : 2 μm/s to 200 μm/s
? Sampling Rate : 50, 100, 200, 500 or 1000 Hz
? Vertical Range : ± 10μm (20μm) at 0.012? vertical resolution, ± 200μm (400μm) at 0.24 ? vertical resolution, ± 1000μm (2000μm) at 1.2 ? vertical resolution
? Horizontal Resolution : 0.01 μm (100 ?) at 2 μm/s scan speed
? Range : 1.0 ? 99.9mg
? Resolution : 0.1mg (~ 0.5mg standard deviation)
? Maximum sample size : 158 mm diameter
? Maximum sample thickness : 21 mm
? Maximum sample weight : 1 kg
? Throat depth : 81mm
? X/Y maximum travel : 151mm x 80mm
  • 제작사 Kla-tencor
  • 모델명 Alpha-Step IQ
  • 도입연도 2004-12
  • 용도 단차를 이용하여 다양한 박막의 두께를 측정